Nanotechnology : NanoSys500

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NanoSys500

Nanotechnology : NanoSys500
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Product Description

NanoSys500 is a complete nanoparticle deposition solution in the shape of a UHV-compatible deposition system. Users can either choose the standard configuration or customise the system according to their specific needs. At the heart of the system lies the NanoGen nanoparticle deposition source (see above) and the source positioning and ancillary chamber components have been specifically designed the maximise the operation of this source. The standard sample manipulator features sample heating, bias and rotation for 2 inch samples. Numerous ports are available for additional deposition sources to allow, for example, matrix encapsulation of nanoparticles for thin-film structures or devices as well as for viewports and optional sample-entry load-lock systems.

Specifications

  • Chamber
  • Construction
  • Port focus
  • Ports

  • Pumping
  • Main pump
  • Differential pump(NanoGen50)
  • Backing pumps
  • Manipulator
  • Sample mount
  • Other
  • Electronics
  • Gauging
  • Frame

M600

  • --
  • Spherical, UHV
  • Centre of sphere
  • 3 x NW200CF 1 x NW150CF 2 x NW100CF 4 x NW63CF 7 x NW35CF
  • --
  • 500 ls Turbodrag
  • 300 ls Turbodrag
  • Dry pumps (scroll)
  • --
  • Suitable for 2” samples
  • --
  • 19" cabinet-mounted
  • Ion gauge/Pirani
  • Low footprint frame on transport casters
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